<?xml version='1.0' encoding='utf-8'?>
<oai_dc:dc xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd">
  <dc:contributor>N. Yu</dc:contributor>
  <dc:contributor>R. Devanathan</dc:contributor>
  <dc:contributor>K.E. Sickafus</dc:contributor>
  <dc:contributor>M.A. Nastasi</dc:contributor>
  <dc:contributor>Gordon L. Nord Jr.</dc:contributor>
  <dc:creator>J.N. Mitchell</dc:creator>
  <dc:date>1997</dc:date>
  <dc:description>A natural single crystal of ilmenite (FeTiO3) was irradiated at 100 K with 200 keV Ar2+. Rutherford backscattering spectroscopy and ion channeling with 2 MeV He+ ions were used to monitor damage accumulation in the surface region of the implanted crystal. At an irradiation fluence of 1 ?? 1015 Ar2+/cm2, considerable near-surface He+ ion dechanneling was observed, to the extent that ion yield from a portion of the aligned crystal spectrum reached the yield level of a random spectrum. This observation suggests that the near-surface region of the crystal was amorphized by the implantation. Cross-sectional transmission electron microscopy and electron diffraction on this sample confirmed the presence of a 150 nm thick amorphous layer. These results are compared to similar investigations on geikielite (MgTiO3) and spinel (MgAl2O4) to explore factors that may influence radiation damage response in oxides.</dc:description>
  <dc:format>application/pdf</dc:format>
  <dc:identifier>10.1016/S0168-583X(96)01140-8</dc:identifier>
  <dc:language>en</dc:language>
  <dc:publisher>Elsevier</dc:publisher>
  <dc:title>Ion irradiation damage in ilmenite at 100 K</dc:title>
  <dc:type>article</dc:type>
</oai_dc:dc>